Lab 3 Heads 1 Inch RF Plasma Magnetron Sputtering Coater Machine with DC Magnetron Sputtering

3 Heads Compact 1 Inch RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option

2 inch RF Plasma Magnetron Sputtering Coater Machine for Non-Conductive Thin Films

2 inch  RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin Films

Lab DC Magnetron Sputtering Coater Machine with Rotary Stage & Water Chiller

High Power DC Magnetron Sputtering Coater w Rotary Stage & Water Chiller

3 Rotary Target Plasma Sputtering Coater Machine Heater (500C) Including 3 Targets

3 Rotary Target Plasma Sputtering Coater w. Substrate Heater (500C) Including 3 Targets

Lab DC Magnetron Sputtering Coater Machine With Target for Noble Metal Coating

Compact DC Magnetron Sputtering Coater With Gold Target for Noble Metal Coating

Lab Powder PVD Coater Machine with DC Magnetron Sputtering & Vibration Stage

Compact Powder PVD Coater with DC Magnetron Sputtering & Vibration Stage

5 Heads RF Plasma Magnetron Sputtering Coater Machine for MGI Thin Film Research

Customized 5 Heads RF Plasma Magnetron Sputtering Coater for MGI Thin Film Research

Combinatorial Plasma Sputtering Coater Machine with Three 2'' magnetron Sputtering Sources and RF/DC Power

Combinatorial Plasma Sputtering Coater with Three 2'' magnetron Sputtering Sources and RF/DC Power Supplies

Lab DC/RF Dual-Head Vacuum 2 Inch Magnetron Plasma Sputtering Coater Machine

DC/RF Dual-Head High Vacuum 2 Inch Magnetron Plasma Sputtering Coater

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm   Introduction Ion Sputtering Coater (SD900 Model)  is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly within 2 minutes when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate. Vacuum pump is included.   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 0-20mA Working pressure 30Pa -7 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support 

DC or RF High Vacuum Magnetron Ion Sputtering Coating Coater

DC or RF High Vacuum Magnetron Ion Sputtering Coating Coater   Introduction High Vacuum Magnetron Ion Sputtering Coater is ideal and designed for materials science and sample preparation. It is widely used for the majority of universities and scientific research institutes of materials science and engineering to coat, for metals, ceramics, semiconductors, insulators or other kinds of membrane material preparation. High Vacuum Magnetron Ion Sputtering Coater provides the most stable sputtering environment and achieves the basic experimental conditions of magnetron sputtering in a very short period of time. It provides DC / RF two kinds of sputtering power options which allow sputtering conductive or non-conductive substance on specimen and improves physical vapor deposition (PVD) Performance. It is also excellent for surface treatment and coating. It is easy to operate and user friendly as well. Vacuum pump and Chiller are included. Parameter Vacuum pump set (Oil required) rotary vacuum pump+(oil free) turbo moleculan pump set Rotary pumping speed 50 Hz : 16 m³/h (4.4 L/s)/ 60 Hz : 19.2 m³/h (5.2 L/s) Molecular pumping speed 300 L/s  Vacuum limit 5* 10-5 Pa Working pressure 0.5-5 Pa Vacuuming time >10 Min(10-3Pa) Vacuum measure Measuring range from atmosphere to 1*10-6 Pa Gas control Gas flow controller Chamber size φ260*200mm (height) metal Magnetron target source Target size φ 50*3mm(Cu)/target source: weak magnetic substance /materials Operation method Instruction Manual Weight/size 100kg/610mm length x 420mm wide x 490mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <3000W Cooling method Air cooling(pump)+ water cooling(sputtering target) Warranty One year limited warranty with lifetime product support

DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation

DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation Introduction   Compact Automatic Ion Sputtering Coater (SD800 Model) that is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate using Time Control. Vacuum pump is included.   Parameter  Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuuming time < 2 Min Chamber size Φ115*100mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 40kg/307mm length x 260mm wide x 260mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support    

Vacuum Pulsing Thermal Evaporating Sputtering Coating Coater with Vacuum Pump

Vacuum Pulsing Thermal Evaporating Sputtering Coating Coater with Vacuum Pump   Introduction Automatic Pulsing Thermal Evaporation Carbon Coater (SD980 Model) that is ideal and designed for lab SEM sample preparation. SD980 Model carbon coater is a fully-automated carbon coater that applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM. A pulsed mode for protecting samples is also included. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It is user friendly and easy to operate by Controlling Touch Screen Heating Power (Current) and Pulsing Times (Recipe). Vacuum pump is included. Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2 Pa Max evaporation current 80A Working pressure 6 Pa - 4 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass Evaporation target source Target material :carbon rope/target source: carbon rope Operation method Instruction Manual Weight/size 45kg/390mm length x 310mm wide x 290mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Warranty One year limited warranty with lifetime product support

Lab DC or RF Magnetron Ion Sputter Coater with Vacuum Pump And Chiller Using in Perovskite Solar Cell Lab Line

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Vacuum Magnetron Ion Sputtering Coater Optional Water Cooling Used to Coat Non-conductive Or Heat-sensitive SEM Samples

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com