DC or RF High Vacuum Magnetron Ion Sputtering Coating Coater

DC or RF High Vacuum Magnetron Ion Sputtering Coating Coater   Introduction High Vacuum Magnetron Ion Sputtering Coater is ideal and designed for materials science and sample preparation. It is widely used for the majority of universities and scientific research institutes of materials science and engineering to coat, for metals, ceramics, semiconductors, insulators or other kinds of membrane material preparation. High Vacuum Magnetron Ion Sputtering Coater provides the most stable sputtering environment and achieves the basic experimental conditions of magnetron sputtering in a very short period of time. It provides DC / RF two kinds of sputtering power options which allow sputtering conductive or non-conductive substance on specimen and improves physical vapor deposition (PVD) Performance. It is also excellent for surface treatment and coating. It is easy to operate and user friendly as well. Vacuum pump and Chiller are included. Parameter Vacuum pump set (Oil required) rotary vacuum pump+(oil free) turbo moleculan pump set Rotary pumping speed 50 Hz : 16 m³/h (4.4 L/s)/ 60 Hz : 19.2 m³/h (5.2 L/s) Molecular pumping speed 300 L/s  Vacuum limit 5* 10-5 Pa Working pressure 0.5-5 Pa Vacuuming time >10 Min(10-3Pa) Vacuum measure Measuring range from atmosphere to 1*10-6 Pa Gas control Gas flow controller Chamber size φ260*200mm (height) metal Magnetron target source Target size φ 50*3mm(Cu)/target source: weak magnetic substance /materials Operation method Instruction Manual Weight/size 100kg/610mm length x 420mm wide x 490mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <3000W Cooling method Air cooling(pump)+ water cooling(sputtering target) Warranty One year limited warranty with lifetime product support

Materials Science Vacuum Magnetron Ion Sputter Coating Coater

Materials Science Vacuum Magnetron Ion Sputter Coating Coater Introduction Materials Science Magnetron Ion Sputtering Coater(SD900M Model) is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample. Coating Result Sample Picture under SEM (by SD-900M Model) EPTFE (Extended Poly Tetra Fluoro Ethylene) Low vacuum, can be achieved quickly when using proper vacuum pump within 5 minutes. It generates much less heat and avoids plasma damage to the substrate sample. It is user friendly and easy to operate. Vacuum pump is included. Chiller is optional. Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s)  Vacuum limit 2 Pa Max sputtering current 100mA Working pressure 20Pa - 8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Water cooling(optional) Warranty One year limited warranty with lifetime product support 

Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation

Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation Introduction     Magnetron Ion Sputtering Unit &Thermal Evaporation Carbon Coater is ideal and designed for lab SEM sample preparation. SD900C Model (Magnetron Ion Sputtering Unit) is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample.     SD900C Model (Thermal Evaporation Carbon Unit) carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM.     Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.     Vacuum pump is included.     Chiller is optional. (for Magnetron Ion Sputtering Unit)   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 100mA Max evaporation current 100A Working pressure 20Pa -8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Evaporation target source Target material:carbon rope /target source:carbon rope Operation method Instruction Manual (2 units)Weight/size 55kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Cooling method Air cooling(Evaporation)+water cooling (sputtering ) Warranty One year limited warranty with lifetime product support