DC or RF High Vacuum Magnetron Ion Sputtering Coating Coater

DC or RF High Vacuum Magnetron Ion Sputtering Coating Coater   Introduction High Vacuum Magnetron Ion Sputtering Coater is ideal and designed for materials science and sample preparation. It is widely used for the majority of universities and scientific research institutes of materials science and engineering to coat, for metals, ceramics, semiconductors, insulators or other kinds of membrane material preparation. High Vacuum Magnetron Ion Sputtering Coater provides the most stable sputtering environment and achieves the basic experimental conditions of magnetron sputtering in a very short period of time. It provides DC / RF two kinds of sputtering power options which allow sputtering conductive or non-conductive substance on specimen and improves physical vapor deposition (PVD) Performance. It is also excellent for surface treatment and coating. It is easy to operate and user friendly as well. Vacuum pump and Chiller are included. Parameter Vacuum pump set (Oil required) rotary vacuum pump+(oil free) turbo moleculan pump set Rotary pumping speed 50 Hz : 16 m³/h (4.4 L/s)/ 60 Hz : 19.2 m³/h (5.2 L/s) Molecular pumping speed 300 L/s  Vacuum limit 5* 10-5 Pa Working pressure 0.5-5 Pa Vacuuming time >10 Min(10-3Pa) Vacuum measure Measuring range from atmosphere to 1*10-6 Pa Gas control Gas flow controller Chamber size φ260*200mm (height) metal Magnetron target source Target size φ 50*3mm(Cu)/target source: weak magnetic substance /materials Operation method Instruction Manual Weight/size 100kg/610mm length x 420mm wide x 490mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <3000W Cooling method Air cooling(pump)+ water cooling(sputtering target) Warranty One year limited warranty with lifetime product support